Novel photoacid generators for chemically amplified resists was written by Asakura, Toshikage;Yamato, Hitoshi;Matsumoto, Akira;Murer, Peter;Ohwa, Masaki. And the article was included in Journal of Photopolymer Science and Technology in 2003.Safety of Ethyl 3-ethoxypropanoate The following contents are mentioned in the article:
Recently the authors developed new class of non-ionic oxime sulfonate PAG. The compounds generate various kinds of sulfonic acids, such as n-propane, n-octane, camphor and p-toluene sulfonic acid under deep-UV exposure and trifluoromethanesulfonic acid under ArF exposure and are applicable for the corresponding chem. amplified (CA) photoresists. The application-relevant properties of the compounds such as solubility in propylene glycol monomethyl ether acetate (PGMEA), Et lactate, Et 3-ethoxypropionate, and 2-heptanone, UV absorption, thermal stability with or without poly(4-hydroxystyrene) (PHS), volatility, performance in model resist formulations were evaluated. In addition, the microlithog. simulation based on the results of DRM results of the trifluoromethanesulfonate was also studied. This study involved multiple reactions and reactants, such as Ethyl 3-ethoxypropanoate (cas: 763-69-9Safety of Ethyl 3-ethoxypropanoate).
Ethyl 3-ethoxypropanoate (cas: 763-69-9) belongs to esters. Esters are widespread in nature and are widely used in industry. In nature, fats are in general triesters derived from glycerol and fatty acids. Esters are responsible for the aroma of many fruits. Liquid esters of low volatility serve as softening agents for resins and plastics. Esters also include many industrially important polymers. Polymethyl methacrylate is a glass substitute sold under the names Lucite and Plexiglas; polyethylene terephthalate is used as a film (Mylar) and as textile fibres sold as Terylene, Fortrel, and Dacron.Safety of Ethyl 3-ethoxypropanoate
Referemce:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics