In organic chemistry, atoms other than carbon and hydrogen are generally referred to as heteroatoms. The most common heteroatoms are nitrogen, oxygen and sulfur. Now I present to you an article called CVD of thin oxygen permeable membrane films, published in 2003, which mentions a compound: 14481-08-4, mainly applied to oxide membrane CVD oxygen permeation, COA of Formula: C22H38NiO4.
Membranes with high mixed oxygen-ionic and electronic conductivity are of great interest for oxygen separation and catalytic membrane reactors for partial oxidation of hydrocarbons. In the diffusion regime oxygen flow through membrane is proportional to its reciprocal thickness and gas tight thin films are most promising for applications. In a single source (aerosol- and flash evaporation) CVD equipment using the mixtures of THD compounds as precursors a number of mixed-conductor layers, (La,Sr)(Ga,Fe)O3, (La,Sr)(Co,Fe)O3, La2NiO4 were deposited with a thickness 3-30 μm and typical deposition rate 10 μm/h. As substrates, various porous flat and tubular materials with a pore size up to 10 μm were tested. The film composition, microstructure and gas tightness were studied. Using post-annealing with oxide fluxes the membranes of the gas tightness high enough for applications were obtained.
Compounds in my other articles are similar to this one(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))COA of Formula: C22H38NiO4, you can compare them to see their pros and cons in some ways,such as convenient, effective and so on.
Reference:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics