Epoxy compounds usually have stronger nucleophilic ability, because the alkyl group on the oxygen atom makes the bond angle smaller, which makes the lone pair of electrons react more dissimilarly with the electron-deficient system. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Atmospheric pressure chemical vapor deposition and characterization of crystalline InTaO4, InNbO4 and InVO4 coatings.Application of 14481-08-4.
The possibilities to grow crystalline complex InTaO4, InNbO4, and InVO4 coatings as well as single oxide layers In2O3, Ta2O5, Nb2O5, and VOx were investigated using aerosol assisted atm. pressure chem. vapor deposition technique. In(III) and Nb(IV) tetramethylheptanedionates, Ta(V) tetraethoxyacetylacetonate, and V(III) acetylacetonate were used as precursors, monoglyme and toluene as solvents. The influence of deposition conditions and solution composition on elemental and phase compositions of layers was studied. InTaO4 layers containing pure monoclinic InTaO4 phase were obtained ex-situ, i.e., after 800° annealing of layers grown at 500°. Films containing pure orthorhombic InVO4 or monoclinic InNbO4 phase may be prepared using both in-situ (600°) or ex-situ (deposition at 400°, annealing at 800°) approaches. Under optimized deposition conditions and solution compositions, Ni-doped InVO4 and InTaO4 films were also deposited and their photocatalytic activity was tested.
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Reference:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics